ReddRadar
Agent skill
ebl-process-controller
Electron Beam Lithography skill for high-resolution nanopatterning with dose optimization and proximity effect correction
Install this agent skill to your Project
npx add-skill https://github.com/a5c-ai/babysitter/tree/main/library/specializations/domains/science/nanotechnology/skills/ebl-process-controller
Metadata
Additional technical details for this skill
- phase
- 6
- domain
- science
- category
- fabrication
- priority
- high
- specialization
- nanotechnology
- tools libraries
-
[ "BEAMER", "GenISys TRACER", "Raith NanoSuite" ]
SKILL.md
EBL Process Controller
Purpose
The EBL Process Controller skill provides comprehensive electron beam lithography process control, enabling high-resolution nanopatterning through dose optimization, proximity effect correction, and critical dimension control.
Capabilities
- Pattern design and fracturing
- Dose optimization and modulation
- Proximity effect correction (PEC)
- Alignment and overlay control
- Resist processing optimization
- Critical dimension (CD) control
Usage Guidelines
EBL Process Control
-
Pattern Preparation
- Design in CAD software
- Fracture into write fields
- Apply beam step size
-
Dose Optimization
- Run dose matrices
- Apply PEC algorithms
- Account for pattern density
-
Process Integration
- Optimize resist thickness
- Control development conditions
- Verify feature dimensions
Process Integration
- Nanolithography Process Development
- Nanodevice Integration Process Flow
Input Schema
{
"pattern_file": "string",
"resist": "string",
"thickness": "number (nm)",
"target_cd": "number (nm)",
"beam_voltage": "number (kV)",
"beam_current": "number (pA)"
}
Output Schema
{
"optimized_dose": "number (uC/cm2)",
"pec_parameters": {
"alpha": "number",
"beta": "number",
"eta": "number"
},
"write_time": "number (hours)",
"expected_cd": "number (nm)",
"cd_uniformity": "number (3sigma)"
}
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